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Photomask

Hard coat

Our hard coat offers superior release performance, significantly reduces the adhesion of resists during exposure to light, and can enable the cleaning of a mask in a wet environment.


Unprocessed

Hard-coat processed

Advantage

    Protects the membrane (emulsion/chrome)
  • Superior stain resistance
  • Easy handling (cleaning)
  • Improved fine-pattern resolution


Hard coat specifications

Item Usually hard coat Thin thickness hard coat Comment
Resin used Silicone resin Fluororesin Proprietary
Coatig thickness 2-3 μm (in-plane distribution ± 0.5 μm)*1 10nm *1:Surface roughness tester
Coating hardness Pencil lead hardness 3H or greater Pencil lead hardness 4H or greater JIS K 5600-5-4 pencil lead hardness testing
Light transmittance 94% or greater corresponding to 365 nm wavelength 95% or greater corresponding to 365 nm wavelength Spectrophotometer
Resistance to UV exposure No decrease in transmittance at exposures up to 7200 J/cm2 No decrease in transmittance at exposures up to 15000 J/cm2 UV exposure testing(on 365nm)
Adhesion Grid peel 100/100 Cellophane peeling
Water resistance No change to coating 60 min. immersion in purified water
Solvent resistance Ethanol / IPA / MEK / Acetone > No change 60 min. immersion in solvent
Chemical resistance Alkali-proof: 5% NaOH aqueous solution; acid-proof: 5% HCL
aqueous solution
No change in either situation
60 min. immersion in chamical
Water repellency Contact angle 90 degrees or more Contact angle 100 degrees or more Contact angle tester
Release performance 1.1 N/cm (peeling speed 300 mm/min) --- 180°cellophane peeling
Corresponding size 4×4 - 28×32
(unit: inch)
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